화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Boron ultrashallow junction formation in silicon by low-energy implantation and rapid thermal annealing in inert and oxidizing ambient
Lerch W, Gluck M, Stolwijk NA, Walk H, Schafer M, Marcus SD, Downey DF, Chow JW
Journal of the Electrochemical Society, 146(7), 2670, 1999
2 On the Averaged Stochastic-Approximation for Linear-Regression
Gyorfi L, Walk H
SIAM Journal on Control and Optimization, 34(1), 31, 1996