검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Chiu J, Dean K, Denham P, George S, Goldberg KA, Hoef B, Jones G, Koh C, La Fontaine B, Ma A, Montgomery W, Niakoula D, Park JO, Wallow T, Wurm S Journal of Vacuum Science & Technology B, 27(1), 66, 2009 |
| 2 |
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Naulleau PP, Anderson CN, Baclea-an LM, Denham P, George S, Goldberg KA, Goldstein M, Hoef B, Jones G, Koh C, La Fontaine B, Montgomery W, Wallow T Journal of Vacuum Science & Technology B, 27(6), 2911, 2009 |
| 3 |
Extreme ultraviolet lithography: From research to manufacturing La Fontaine B, Deng Y, Kim RH, Levinson HJ, Okoroanyanwu U, Sandberg R, Wallow T, Wood O Journal of Vacuum Science & Technology B, 25(6), 2089, 2007 |
| 4 |
Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Naulleau PP, Anderson CN, Dean K, Denham P, Goldberg KA, Hoef B, Niakoula D, La Fontaine B, Wallow T Journal of Vacuum Science & Technology B, 25(6), 2132, 2007 |
| 5 |
Are extreme ultraviolet resists ready for the 32 nm node? Petrillo K, Wei Y, Brainard R, Denbeaux G, Goldfarb D, Koay CS, Mackey J, Montgomery W, Pierson W, Wallow T, Wood O Journal of Vacuum Science & Technology B, 25(6), 2490, 2007 |