화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Neutral particle proximity lithography: Noncontact nanoscale printing without charge-related artifacts
Craver B, Nounu H, Wasson J, Wolfe JC
Journal of Vacuum Science & Technology B, 26(6), 1866, 2008
2 Effects of smoothing on defect printability at extreme ultraviolet wavelengths
Cardinale GF, Ray-Chaudhuri AK, Fisher A, Mangat PSJ, Wasson J, Mirkarimi PB, Gullikson E
Journal of Vacuum Science & Technology B, 18(6), 2944, 2000
3 Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H
Journal of Vacuum Science & Technology B, 17(6), 3127, 1999
4 Fabrication of silicon stencil masks with vitreous carbon ion-absorbing coatings
Ruchhoeft P, Wolfe JC, Wasson J, Torres J, Wu H, Nounu H, Liu N, Herbordt M, Morgan MD, Tiberio RC
Journal of Vacuum Science & Technology B, 16(6), 3599, 1998