검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Phase diagrams of laser-processed nanoparticles of brass Kazakevich PV, Simakin AV, Shafeev GA, Monteverde F, Wautelet M Applied Surface Science, 253(19), 7724, 2007 |
| 2 |
Micro-structuring of TiO2 thin films by laser-assisted diffraction processing Van Overschelde O, Guisbiers G, Wautelet M Applied Surface Science, 253(19), 7890, 2007 |
| 3 |
Excimer laser ablation of thin titanium oxide films on glass Van Overschelde O, Dinu S, Guisbiers G, Monteverde F, Nouvellon C, Wautelet M Applied Surface Science, 252(13), 4722, 2006 |
| 4 |
Oxygen active species in an Ar-O-2 magnetron discharge for titanium oxide deposition Vancoppenolle V, Jouan PY, Ricard A, Wautelet M, Dauchot JP, Hecq M Applied Surface Science, 205(1-4), 249, 2003 |
| 5 |
Experimental and theoretical study of the role of the gas composition and plasma-surface interactions on the SnOx films stoichiometry prepared by DC magnetron reactive sputtering Snyders R, Wautelet M, Gouttebaron R, Dauchot JP, Hecq M Thin Solid Films, 423(2), 125, 2003 |
| 6 |
Density and temperature in an inductively amplified magnetron discharge for titanium deposition Ricard A, Nouvellon C, Konstantinidis S, Dauchot JP, Wautelet M, Hecq M Journal of Vacuum Science & Technology A, 20(4), 1488, 2002 |
| 7 |
Diagnostics by optical absorption of sputtered atom density in magnetron discharges Dony MF, Dauchot JP, Wautelet M, Hecq M, Ricard A Journal of Vacuum Science & Technology A, 18(3), 809, 2000 |
| 8 |
Glow discharge mass spectrometry study of the deposition of TiO2 thin films by direct current reactive magnetron sputtering of a Ti target Vancoppenolle V, Jouan PY, Wautelet M, Dauchot JP, Hecq M Journal of Vacuum Science & Technology A, 17(6), 3317, 1999 |
| 9 |
Comparison of Direct-Current and Radio-Frequency Argon Magnetron Discharges by Optical-Emission and Absorption-Spectroscopy Dony MF, Ricard A, Wautelet M, Dauchot JP, Hecq M Journal of Vacuum Science & Technology A, 15(4), 1890, 1997 |
| 10 |
Modeling of Reactive Sputtering of Compound Films in the Presence of Bias Sputtering Wautelet M, Debal F, Dauchot JP, Hecq M Journal of Vacuum Science & Technology A, 13(5), 2600, 1995 |