| 1 |
Role of neutral molecule chemistry in electron cyclotron resonance microwave plasmas capable of diamond deposition
Blumenthal R, Webb SF
Journal of Vacuum Science & Technology B, 24(2), 643, 2006 |
| 2 |
Investigation of 4% carbon in hydrogen electron cyclotron resonance microwave plasmas using ethane as the source gas
Webb SF, Gaddy GA, Blumenthal R
Journal of Vacuum Science & Technology A, 17(5), 2456, 1999 |
| 3 |
Supersonic pulse, plasma sampling mass spectrometry: Theory and practice
Gaddy GA, Webb SF, Blumenthal R
Plasma Chemistry and Plasma Processing, 19(4), 513, 1999 |
| 4 |
Distribution of species within an ethylene electron cyclotron resonance-microwave plasma
Webb SF, Gaddy GA, Blumenthal R
Journal of Vacuum Science & Technology A, 16(4), 2148, 1998 |
| 5 |
Determining the Number of Chemical Steps Responsible, for the Distribution of Molecular-Species Within an Electron-Cyclotron-Resonance Microwave Plasma
Webb SF, Gaddy GA, Blumenthal R
Journal of Vacuum Science & Technology A, 15(3), 647, 1997 |
| 6 |
The Chemical-Composition of Diamond Plasmas
Zhu H, Webb SF, Blumenthal R
Journal of Vacuum Science & Technology A, 14(3), 952, 1996 |
