화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Smooth and vertical-sidewall InP etching using Cl-2/N-2 inductively coupled plasma
Lin J, Leven A, Weimann NG, Yang Y, Kopf RF, Reyes R, Chen YK, Chao FS
Journal of Vacuum Science & Technology B, 22(2), 510, 2004
2 Thin-film resistor fabrication for InP technology applications
Kopf RF, Melendes R, Jacobson DC, Tate A, Melendes MA, Reyes RR, Hamm RA, Yang Y, Frackoviak J, Weimann NG, Maynard HL, Liu CT
Journal of Vacuum Science & Technology B, 20(3), 871, 2002