검색결과 : 2건
No. | Article |
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1 |
Smooth and vertical-sidewall InP etching using Cl-2/N-2 inductively coupled plasma Lin J, Leven A, Weimann NG, Yang Y, Kopf RF, Reyes R, Chen YK, Chao FS Journal of Vacuum Science & Technology B, 22(2), 510, 2004 |
2 |
Thin-film resistor fabrication for InP technology applications Kopf RF, Melendes R, Jacobson DC, Tate A, Melendes MA, Reyes RR, Hamm RA, Yang Y, Frackoviak J, Weimann NG, Maynard HL, Liu CT Journal of Vacuum Science & Technology B, 20(3), 871, 2002 |