| 1 |
Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric
Bethge O, Henkel C, Abermann S, Pozzovivo G, Stoeger-Pollach M, Werner WSM, Smoliner J, Bertagnolli E
Applied Surface Science, 258(8), 3444, 2012 |
| 2 |
Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy
Powell CJ, Jablonski A, Werner WSM, Smekal W
Applied Surface Science, 239(3-4), 470, 2005 |
| 3 |
Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy (vol 239, pg 470, 2005)
Powell CJ, Jablonski A, Werner WSM, Smekal W
Applied Surface Science, 242(3-4), 219, 2005 |
| 4 |
Quantitative surface analysis with electrons
Werner WSM
Applied Surface Science, 235(1-2), 2, 2004 |
| 5 |
Angular dependence of the surface excitation probability for medium energy electrons backscattered from Al and Si surfaces
Werner WSM, Smekal W, Stori H, Eisenmenger-Sittner C
Journal of Vacuum Science & Technology A, 19(5), 2388, 2001 |
| 6 |
Auger voltage contrast imaging for the delineation of two-dimensional junctions in cross-sectioned metal-oxide-semiconductor devices
Werner WSM, Lakatha H, Smith HE, LeTarte L, Ambrose V, Baker J
Journal of Vacuum Science & Technology B, 16(1), 420, 1998 |
