검색결과 : 29건
| No. | Article |
|---|---|
| 1 |
Bottom-Up Engineering of Subnanometer Copper Diffusion Barriers Using NH2-Derived Self-Assembled Monolayers Caro AM, Armini S, Richard O, Maes G, Borghs G, Whelan CM, Travaly Y Advanced Functional Materials, 20(7), 1125, 2010 |
| 2 |
Copper CMP with Composite Polymer Core-Silica Shell Abrasives: A Defectivity Study Armini S, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 156(1), H18, 2009 |
| 3 |
Mixed organic/inorganic abrasive particles during oxide CMP Armini S, Whelan CM, Moinpour M, Maex K Electrochemical and Solid State Letters, 11(7), H197, 2008 |
| 4 |
Engineering polymer core-silica shell size in the composite abrasives for CMP applications Armini S, Whelan CM, Maex K Electrochemical and Solid State Letters, 11(10), H280, 2008 |
| 5 |
Interaction forces between a glass surface and ceria-modified PMMA-Based abrasives for CMP measured by colloidal probe AFM Armini S, Burtovyy R, Moinpour M, Luzinov I, De Messemaeker J, Whelan CM, Maex K Journal of the Electrochemical Society, 155(4), H218, 2008 |
| 6 |
Composite polymer core-silica shell abrasives: The effect of the shape of the silica particles on oxide CMP Armini S, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 155(6), H401, 2008 |
| 7 |
Composite polymer core-ceria shell abrasive particles during oxide CMP: A defectivity study Armini S, De Messemaeker J, Whelan CM, Moinpour M, Maex K Journal of the Electrochemical Society, 155(9), H653, 2008 |
| 8 |
Interaction forces between a glass surface and silica-modified PMMA-based abrasives for CMP measured by colloidal AFM Armini S, Burtovyy R, Luzinov I, Whelan CM, Maex K, Moinpour M Electrochemical and Solid State Letters, 10(2), H74, 2007 |
| 9 |
Composite polymer core-silica shell abrasives effect of polishing time and slurry solid content on oxide CMP Armini S, Whelan CM, Moinpour M, Maex K Electrochemical and Solid State Letters, 10(9), H243, 2007 |
| 10 |
Composite polymer-core silica-shell abrasive particles during oxide CMP Armini S, Whelan CM, Maex K, Hernandez JL, Moinpour M Journal of the Electrochemical Society, 154(8), H667, 2007 |