검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Synthesis and cytocompatibility of manganese (II) and iron (III) substituted hydroxyapatite nanoparticles Li Y, Widodo J, Lim S, Ooi C Journal of Materials Science, 47(2), 754, 2012 |
| 2 |
Line resistance and electromigration variations induced by hydrogen-based plasma modifications to the silicon carbonitride/copper interface Ryan ET, Martin J, Bonilla G, Molis S, Spooner T, Widodo J, Kim JH, Liniger E, Grill A, Hu CK Journal of the Electrochemical Society, 154(7), H604, 2007 |
| 3 |
Effect of porosity and adhesion promoter layer on adhesion energy of nanoporous inorganic low-kappa Damayanti M, Gan ZH, Sritharan T, Mhaisalkar SG, Naman A, Widodo J, Tan HS Thin Solid Films, 504(1-2), 213, 2006 |
| 4 |
Comparative study of trimethyl silane and tetramethylcyclotetrasiloxane-based low-k films Widodo J, Goh LN, Lu W, Mhaisalkar SG, Zeng KY, Hsia LC Journal of the Electrochemical Society, 152(4), G246, 2005 |
| 5 |
Effects of CO2 and O-2 on the property of tetra methyl tetra cyclo siloxanes based low-k film Widodo J, Lu W, Mhaisalkar SG, Sudijono JL, Hsia LC, Shen L, Zeng KY Thin Solid Films, 472(1-2), 195, 2005 |
| 6 |
Effects of O-2 and He on the properties of the trimethyl silane based low-k films Widodo J, Goh LN, Lu W, Mhaisalkar SG, Ong S, Sudijono JL, Hsia LC, Tan PY, Zeng KY Journal of Vacuum Science & Technology B, 22(3), 1030, 2004 |
| 7 |
Characterization of tetra methyl cyclo tetra siloxanes-based low-k dielectric film Widodo J, Lu W, Mhaisalkar SG, Hsia LC, Tan PY, Shen L, Zeng KY Thin Solid Films, 462-63, 213, 2004 |