화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Current-transport properties of atomic-layer-depo sited ultrathin Al2O3 on GaAs
Lin HC, Ye PD, Wilk GD
Solid-State Electronics, 50(6), 1012, 2006
2 Chemical vapor deposition of HfO2 films on Si(100)
Sayan S, Aravamudhan S, Busch BW, Schulte WH, Cosandey F, Wilk GD, Gustafsson T, Garfunkel E
Journal of Vacuum Science & Technology A, 20(2), 507, 2002
3 Ultra-thin gate oxide reliability projections
Weir BE, Alam MA, Silverman PJ, Baumann F, Monroe D, Bude JD, Timp GL, Hamad A, Ma Y, Brown MM, Hwang D, Sorsch TW, Ghetti A, Wilk GD
Solid-State Electronics, 46(3), 321, 2002
4 Does chemistry really matter in the chemical vapor deposition of titanium dioxide? Precursor and kinetic effects on the microstructure of polycrystalline films
Taylor CJ, Gilmer DC, Colombo DG, Wilk GD, Campbell SA, Roberts J, Gladfelter WL
Journal of the American Chemical Society, 121(22), 5220, 1999
5 Growth and microstructure of Si/CaF2/Si(111) heterostructures
Gribelyuk MA, Wilk GD
Thin Solid Films, 339(1-2), 51, 1999