검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Zirconium-assisted reaction in low temperature atomic layer deposition using Bis(ethyl-methyl-amino)silane and water Won SJ, Kim JR, Suh S, Choi YJ, Kim HJ Applied Surface Science, 257(23), 10311, 2011 |
| 2 |
Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas Won SJ, Suh S, Lee SW, Choi GJ, Hwang CS, Kim HJ Electrochemical and Solid State Letters, 13(2), G13, 2010 |
| 3 |
Substrate Dependent Growth Rate of Plasma-Enhanced Atomic Layer Deposition of Titanium Oxide Using N2O Gas (vol 13, pg G13, 2010) Won SJ, Suh S, Lee SW, Choi GJ, Hwang CS, Kim HJ Electrochemical and Solid State Letters, 13(4), S3, 2010 |
| 4 |
The Bias Temperature Instability Characteristics of In Situ Nitrogen Incorporated ZrOxNy Gate Dielectrics Jung HS, Park JM, Kim HK, Kim JH, Won SJ, Lee J, Lee SY, Hwang CS, Kim WH, Song MW, Lee NI, Cho DY Electrochemical and Solid State Letters, 13(9), G71, 2010 |
| 5 |
Electrical and Bias Temperature Instability Characteristics of n-Type Field-Effect Transistors Using HfOxNy Gate Dielectrics Jung HS, Kim HK, Kim JH, Won SJ, Cho DY, Lee J, Lee SY, Hwang CS, Park JM, Kim WH, Song MW, Lee NI, Heo S Journal of the Electrochemical Society, 157(5), G121, 2010 |
| 6 |
Capacitance and Interface Analysis of Transparent Analog Capacitor Using Indium Tin Oxide Electrodes and High-k Dielectrics Won SJ, Huh MS, Park S, Suh S, Park TJ, Kim JH, Hwang CS, Kim HJ Journal of the Electrochemical Society, 157(7), G170, 2010 |
| 7 |
Improving the Morphological and Optical Properties of Sputtered Indium Tin Oxide Thin Films by Adopting Ultralow-Pressure Sputtering Huh MS, Yang BS, Song J, Heo J, Won SJ, Jeong JK, Hwang CS, Kim HJ Journal of the Electrochemical Society, 156(1), J6, 2009 |
| 8 |
Plasma-Enhanced Atomic Layer Deposition of TiO2 and Al-Doped TiO2 Films Using N2O and O-2 Reactants Choi GJ, Kim SK, Won SJ, Kim HJ, Hwang CS Journal of the Electrochemical Society, 156(9), G138, 2009 |
| 9 |
Morusin induces apoptosis and suppresses NF-kappa B activity in human colorectal cancer HT-29 cells Lee JC, Won SJ, Chao CL, Wu FL, Liu HS, Ling P, Lin CN, Su CL Biochemical and Biophysical Research Communications, 372(1), 236, 2008 |
| 10 |
The role of the methyl and hydroxyl groups of low-k dielectric films on the nucleation of ruthenium by ALD Heo J, Won SJ, Eom D, Lee SY, Ahn YB, Hwang CS, Kim HJ Electrochemical and Solid State Letters, 11(8), H210, 2008 |