| 1 |
천연가스의 탄화수소 이슬점 측정방법 비교 연구
이강진, 하영철, 허재영, 우진춘, 김용두, 배현길
Korean Chemical Engineering Research, 53(4), 496, 2015 |
| 2 |
The use of high density plasma system to improve the etch properties of the zinc tin oxide thin film for transparent thin film transistors active layers
Woo JC, Chun YS, Kim CI
Applied Surface Science, 292, 915, 2014 |
| 3 |
Gel polymer electrolytes based on nanofibrous polyacrylonitrile-acrylate for lithium batteries
Kim DS, Woo JC, Youk JH, Manuel J, Ahn JH
Materials Research Bulletin, 58, 208, 2014 |
| 4 |
The Dry Etching Characteristics of HfAlO3 Thin Films in CF4/Cl-2/Ar Inductively Coupled Plasma
Woo JC, Ha TK, Kim CI
Journal of the Electrochemical Society, 159(1), D26, 2012 |
| 5 |
A Surface Properties of ZrO2 Thin Films Using Adaptively Coupled Plasma Source
Woo JC, Kim CI
Journal of the Electrochemical Society, 159(2), D91, 2012 |
| 6 |
A Study of the Surface Chemical Reactions on IGZO Thin Film in BCl3/Ar Inductively Coupled Plasma
Joo YH, Woo JC, Kim CI
Journal of the Electrochemical Society, 159(4), D190, 2012 |
| 7 |
Dry etching characteristics of TiN thin films in CF4/BCl3/N-2 plasma
Joo YH, Woo JC, Kim CI
Thin Solid Films, 520(6), 2339, 2012 |
| 8 |
Surface treatments of indium tin oxide films by using high density plasma
Wi JH, Woo JC, Kim CI
Thin Solid Films, 519(20), 6824, 2011 |
| 9 |
A study on the etch characteristics of HfAlO3 dielectric thin film in Cl-2/Ar gas chemistry using inductively coupled plasma system
Woo JC, Ha TK, Um DS, Park J, Kang YC, Kim CI
Thin Solid Films, 520(3), 1141, 2011 |
| 10 |
Effects of N-2 and NH3 remote plasma nitridation on the structural and electrical characteristics of the HfO2 gate dielectrics
Park KS, Baek KH, Kim DP, Woo JC, Do LM, No KS
Applied Surface Science, 257(4), 1347, 2010 |
