화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Detailed analysis of the influence of an inductively coupled plasma reactive-ion etching process on the hole depth and shape of photonic crystals in InP/InGaAsP
Strasser P, Wuest R, Robin F, Erni D, Jackel H
Journal of Vacuum Science & Technology B, 25(2), 387, 2007
2 Fabrication of a hard mask for InP based photonic crystals: Increasing the plasma-etch selectivity of poly(methyl methacrylate) versus SiO2 and SiNx
Wuest R, Strasser P, Robin F, Erni D, Jackel H
Journal of Vacuum Science & Technology B, 23(6), 3197, 2005