검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Modeling of dc magnetron plasma for sputtering: Transport of sputtered copper atoms Yagisawa T, Makabe T Journal of Vacuum Science & Technology A, 24(4), 908, 2006 |
| 2 |
Modeling of radial uniformity at a wafer interface in a 2f-CCP for SiO2 etching Yagisawa T, Shimada T, Makabe T Journal of Vacuum Science & Technology B, 23(5), 2212, 2005 |
| 3 |
Modeling of the influence of dielectric target on interface sheath characteristics in a radio-frequency magnetron sputtering Kuroiwa S, Mine T, Yagisawa T, Makabe T Journal of Vacuum Science & Technology B, 23(5), 2218, 2005 |