화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Effect of halogen in high-density oxygen plasmas on photoresist trimming
Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L
AIChE Journal, 50(7), 1578, 2004
2 Photoresist trimming in oxygen-based high-density plasmas: Effect of HBr and Cl-2 addition to CF4/O-2 mixtures
Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L
Industrial & Engineering Chemistry Research, 42(24), 6080, 2003
3 Resist trimming in high-density CF4/O-2 plasmas for sub-0.1 mu m device fabrication
Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L
Journal of Vacuum Science & Technology B, 20(5), 1974, 2002