검색결과 : 112건
| No. | Article |
|---|---|
| 1 |
Freestanding graphene writing on a silicon carbide wafer Kim EH, Ahn JR, Park JH, Khadk IB, Son J, Kim HW, Lee DH, Kim BJ, Sung DI, Woo SH, Yeom GY, Park SH, Ahn JR Current Applied Physics, 20(12), 1435, 2020 |
| 2 |
Low-temperature wafer-scale growth of MoS2-graphene heterostructures Kim HU, Kim M, Jin Y, Hyeon Y, Kim KS, An BS, Yang CW, Kanade V, Moonn JY, Yeom GY, Whang D, Lee JH, Kim T Applied Surface Science, 470, 129, 2019 |
| 3 |
Properties of tungsten thin film deposited using inductively coupled plasma assisted sputtering for next-generation interconnect metal Lee SJ, Kim TH, Jeong BH, Kim KN, Yeom GY Thin Solid Films, 674, 64, 2019 |
| 4 |
Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering Kim TH, Lee SJ, Kim DH, Kim DW, Bae JW, Kim KN, Kim YM, Yeom GY Thin Solid Films, 660, 601, 2018 |
| 5 |
A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique Jo SH, Kang DH, Shim J, Jeon J, Jeon MH, Yoo G, Kim J, Lee J, Yeom GY, Lee S, Yu HY, Choi C, Park JH Advanced Materials, 28(24), 4824, 2016 |
| 6 |
High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment Shim J, Oh A, Kang DH, Oh S, Jang SK, Jeon J, Jeon MH, Kim M, Choi C, Lee J, Lee S, Yeom GY, Song YJ, Park JH Advanced Materials, 28(32), 6985, 2016 |
| 7 |
Recent Advances in Doping of Molybdenum Disulfide: Industrial Applications and Future Prospects Pham VP, Yeom GY Advanced Materials, 28(41), 9024, 2016 |
| 8 |
Very high frequency plasma reactant for atomic layer deposition Oh IK, Yoo G, Yoon CM, Kim TH, Yeom GY, Kim K, Lee Z, Jung H, Lee CW, Kim H, Lee HBR Applied Surface Science, 387, 109, 2016 |
| 9 |
Atmospheric pressure plasmas for surface modification of flexible and printed electronic devices: A review Kim KN, Lee SM, Mishra A, Yeom GY Thin Solid Films, 598, 315, 2016 |
| 10 |
Low-Temperature Synthesis of Large-Scale Molybdenum Disulfide Thin Films Directly on a Plastic Substrate Using Plasma-Enhanced Chemical Vapor Deposition Ahn C, Lee J, Kim HU, Bark H, Jeon M, Ryu GH, Lee Z, Yeom GY, Kim K, Jung J, Kim Y, Lee C, Kim T Advanced Materials, 27(35), 5223, 2015 |