검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Deep-submicron trench profile control using a magnetron enhanced reactive ion etching system for shallow trench isolation Yeon CK, You HJ Journal of Vacuum Science & Technology A, 16(3), 1502, 1998 |
| 2 |
Study of Particulate Formation and Its Control by a Radio-Frequency Power Modulation in the Reactive Ion Etching Process of SiO2 with CF4/H-2 Plasma Yeon CK, Whang KW Journal of Vacuum Science & Technology A, 15(1), 66, 1997 |
| 3 |
Effects of Bias Frequency on Reactive Ion Etching Lag in an Electron-Cyclotron-Resonance Plasma-Etching System Doh HH, Yeon CK, Whang KW Journal of Vacuum Science & Technology A, 15(3), 664, 1997 |
| 4 |
Dynamics of Particulates in the Afterglow of a Radio-Frequency Excited Plasma Yeon CK, Kim JH, Whang KW Journal of Vacuum Science & Technology A, 13(3), 927, 1995 |
| 5 |
Generation and Behavior of Particulates in a Radio-Frequency Excited CH4 Plasma Yeon CK, Whang KW Journal of Vacuum Science & Technology A, 13(4), 2044, 1995 |