검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Non-Contact and Non-Destructive Characterization Alternatives of Ultra-Shallow Implanted Silicon p-n Junctions by Multi-Wavelength Raman and Photoluminescence Spectroscopy Yoo WS, Ueda T, Ishigaki T, Kang K, Fukumoto M, Hasuike N, Harima H, Yoshimoto M Journal of the Electrochemical Society, 158(1), H80, 2011 |
| 2 |
Nanofiber deposition by electroblowing of PVA (polyvinyl alcohol) Kong CS, Yoo WS, Lee KY, Kim HS Journal of Materials Science, 44(4), 1107, 2009 |
| 3 |
Application of UV-Raman Spectroscopy for characterization of the physical crystal structure following flash anneal of an ultrashallow implanted layer Yoshimoto M, Nishigaki H, Harima H, Isshiki T, Kang K, Yoo WS Journal of the Electrochemical Society, 153(7), G697, 2006 |
| 4 |
Nonconventional flash annealing on shallow indium implants in silicon Gennaro S, Giubertoni D, Bersani M, Foggiato J, Yoo WS, Gwilliam R Journal of Vacuum Science & Technology B, 24(1), 473, 2006 |
| 5 |
Implementation of flash technology for ultra shallow junction formation: Challenges in process integration Foggiato J, Yoo WS Journal of Vacuum Science & Technology B, 24(1), 515, 2006 |
| 6 |
Development of an arc sensor with mechanized rotation of electrode Kim CH, Yoo WS, Na SJ Materials Science Forum, 426-4, 4135, 2003 |
| 7 |
Implant anneal using a single-wafer furnace and a lamp-based rapid thermal annealing system Yoo WS, Fukada T, Setokubo T, Aizawa K, Ohsawa T, Takahashi N, Enjoji K Journal of the Electrochemical Society, 149(7), G424, 2002 |
| 8 |
Improvement of Adhesion Properties of Fluorinated Silica Glass-Films by Nitrous-Oxide Plasma Treatment Swope R, Yoo WS, Hsieh J, Shuchmann S, Nagy F, Nijenhuis HT, Mordo D Journal of the Electrochemical Society, 144(7), 2559, 1997 |
| 9 |
Analysis of Fourier-Transform Infrared-Spectra and Peak Shifts in Plasma-Enhanced Chemical-Vapor-Deposited Fluorinated Silica Glasses Swope R, Yoo WS Journal of Vacuum Science & Technology B, 14(3), 1702, 1996 |