화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Etching technique for ruthenium with a high etch rate and high selectivity using ozone gas
Nakahara M, Tsunekawa S, Watanabe K, Arai T, Yunogami T, Kuroki K
Journal of Vacuum Science & Technology B, 19(6), 2133, 2001
2 Anisotropic etching of RuO2 and Ru with high aspect ratio for gigabit dynamic random access memory
Yunogami T, Nojiri K
Journal of Vacuum Science & Technology B, 18(4), 1911, 2000
3 Development of Neutral-Beam-Assisted Etcher
Yunogami T, Yokogawa K, Mizutani T
Journal of Vacuum Science & Technology A, 13(3), 952, 1995