검색결과 : 1건
No. | Article |
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1 |
Improvement of substrate temperature uniformity by using a dual-zone substrate heater in a commercial 4 in. GEN-III molecular beam epitaxy single-wafer reactor Fang XM, Yurasits TR, Loubychev D, Wu Y, Liu WK, DeBruzzi M, Priddy S, Schiprett C Journal of Vacuum Science & Technology B, 19(4), 1554, 2001 |