검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Selective Dry-Etching of Oxide-Films for Spacer Applications in a High-Density Plasma Allen LR, Yuwang V, Sato M Journal of Vacuum Science & Technology B, 14(6), 3470, 1996 |
| 2 |
Substrate Bias Effects in High-Aspect-Ratio SiO2 Contact Etching Using an Inductively-Coupled Plasma Reactor Westerheim AC, Labun AH, Dubash JH, Arnold JC, Sawin HH, Yuwang V Journal of Vacuum Science & Technology A, 13(3), 853, 1995 |