검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Evaluation of C4F8O as an alternative plasma-enhanced chemical vapor deposition chamber clean chemistry Pruette L, Karecki S, Reif R, Tousignant L, Reagan W, Kesari S, Zazzera L Journal of the Electrochemical Society, 147(3), 1149, 2000 |
| 2 |
Infrared Study of Process Emissions During C3F8/O-2 Plasma Cleaning of Plasma-Enhanced Chemical-Vapor-Deposition Chambers Zazzera L, Reagen W, Cheng A Journal of the Electrochemical Society, 144(10), 3597, 1997 |