검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material Zhirnov E, Stepanov S, Gott A, Wang WN, Shreter YG, Tarkhin DV, Bochkareva NI Journal of Vacuum Science & Technology A, 23(4), 687, 2005 |
| 2 |
Influence of cathode material and SiCl4 gas on inductively coupled plasma etching of AlGaN layers with Cl-2/Ar plasma Zhirnov E, Stepanov S, Wang WN, Shreter YG, Takhin DV, Bochkareva NI Journal of Vacuum Science & Technology A, 22(6), 2336, 2004 |