검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
New Direct Approach for Determining the Reverse Intersystem Crossing Rate in Organic Thermally Activated Delayed Fluorescent (TADF) Emitters Vazquez RJ, Yun JH, Muthike AK, Howell M, Kim H, Madu IK, Kim T, Zimmerman P, Lee JY, Goodson T Journal of the American Chemical Society, 142(18), 8074, 2020 |
| 2 |
Predicting and Controlling Entangled Two-Photon Absorption in Diatomic Molecules Burdick RK, Varnayski O, Molina A, Upton L, Zimmerman P, Goodson T Journal of Physical Chemistry A, 122(41), 8198, 2018 |
| 3 |
Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction Costner EA, Long BK, Navar C, Jockusch S, Lei XG, Zimmerman P, Campion A, Turro NJ, Willson CG Journal of Physical Chemistry A, 113(33), 9337, 2009 |
| 4 |
Silicon orientation effects in the atomic layer deposition of Hafnium oxide Nyns L, Ragnarsson LA, Hall L, Delabie A, Heyns M, Van Elshocht S, Vinckier C, Zimmerman P, De Gendt S Journal of the Electrochemical Society, 155(2), G9, 2008 |
| 5 |
Mechanism of 157 nm photodegradation of poly[4,5-difluoro-2,2-bis(trifluoromethyl)-1,3-dioxole-co-tetrafluoroeth ylene] (Teflon AF) Blakey I, George GA, Hill DJT, Liu HP, Rasoul F, Rintoul L, Zimmerman P, Whittaker AK Macromolecules, 40(25), 8954, 2007 |
| 6 |
Metallorganic chemical vapor deposition of dysprosium scandate high-k layers using mmp-type precursors Van Elshocht S, Lehnen P, Seitzinger B, Abrutis A, Adelmann C, Brijs B, Caymax M, Conard T, De Gendt S, Franquet A, Lohe C, Lukosius M, Moussa A, Richard O, Williams P, Witters T, Zimmerman P, Heyns M Journal of the Electrochemical Society, 153(9), F219, 2006 |
| 7 |
Minimization of MuGFET source/drain resistance using wrap-around NiSi-HDD contacts Dixit A, Anil KG, Collaert N, Zimmerman P, Jurczak M, De Meyer K Solid-State Electronics, 50(7-8), 1466, 2006 |
| 8 |
Synthesis of metal-teflon AF nanocomposites by solution-phase methods Evanoff DD, Zimmerman P, Chumanov G Advanced Materials, 17(15), 1905, 2005 |
| 9 |
157 nm pellicles (thin films) for photolithography: Mechanistic investigation of the VUV and UV-C photolysis of fluorocarbons Lee K, Jockusch S, Turro NJ, French RH, Wheland RC, Lemon MF, Braun AM, Widerschpan T, Dixon DA, Li J, Ivan M, Zimmerman P Journal of the American Chemical Society, 127(23), 8320, 2005 |
| 10 |
XPS and F-19 NMR study of the photodegradation at 157 nm of photolithographic-grade teflon AF thin films Blakey L, George GA, Hill DJT, Liu HP, Rasoul F, Whittaker AK, Zimmerman P Macromolecules, 38(10), 4050, 2005 |