| 1 |
Two-dimensional recrystallisation processes of nanometric vanadium oxide thin films grown by atomic layer chemical vapor deposition (ALCVD) evidenced by AFM
Groult H, Balnois E, Mantoux A, Le Van K, Lincot D
Applied Surface Science, 252(16), 5917, 2006 |
| 2 |
Properties of TiN films grown by atomic-layer chemical vapor deposition with a modified gaseous-pulse sequence
Cheng HE, Lee WJ
Materials Chemistry and Physics, 97(2-3), 315, 2006 |
| 3 |
Effect of carbon on the thermal stability of a Si atomic layer on Ge(100)
Fujiu M, Takahashi K, Sakuraba M, Murota J
Applied Surface Science, 224(1-4), 206, 2004 |
| 4 |
Structural and electronic properties of the 6H-SiC(0001)/Al2O3 interface prepared by atomic layer deposition
Seyller T, Gao K, Ley L, Ciobanu F, Pensl G, Tadich A, Riley JD, Leckey RCG
Materials Science Forum, 457-460, 1369, 2004 |
| 5 |
Si 기판에서 원자층 화학 기상 증착법으로 제조된 Al2O3 및 ZrO2 유전 박막의 결정학적 특성 및 계면 구조 평가
김중정, 양준모, 임관용, 조흥재, 김원, 박주철, 이순영, 김정선, 김근홍, 박대규
Korean Journal of Materials Research, 13(8), 497, 2003 |
| 6 |
CuInS2-TiO2 heterojunctions solar cells obtained by atomic layer deposition
Nanu M, Reijnen L, Meester B, Goossens A, Schoonman J
Thin Solid Films, 431-432, 492, 2003 |
| 7 |
Applications of Atomic Layer Chemical Vapor Deposition for the Processing of Nanolaminate Structures
Yong K, Jeong J
Korean Journal of Chemical Engineering, 19(3), 451, 2002 |
