화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Methodology to separate channel conductions of two level vertically stacked SOI nanowire MOSFETs
Paz BC, Casse M, Barraud S, Reimbold G, Vinet M, Faynot O, Pavanello MA
Solid-State Electronics, 149, 62, 2018
2 Enhanced dynamic threshold voltage UTBB SOI nMOSFETs
Sasaki KRA, Manini MB, Simoen E, Claeys C, Martino JA
Solid-State Electronics, 112, 19, 2015
3 Experimental study of back gate bias effect and short channel effect in ultra-thin buried oxide tri-gate nanowire MOSFETs
Ota K, Saitoh M, Tanaka C, Numata T
Solid-State Electronics, 91, 123, 2014
4 Improved retention times in UTBOX nMOSFETs for 1T-DRAM applications
Sasaki KRA, Nicoletti T, Almeida LM, dos Santos SD, Nissimoff A, Aoulaiche M, Simoen E, Claeys C, Martino JA
Solid-State Electronics, 97, 30, 2014
5 Gate-induced floating-body effect (GIFBE) in fully depleted triple-gate n-MOSFETs
Na KI, Cristoloveanu S, Bae YH, Patruno P, Xiong W, Lee JH
Solid-State Electronics, 53(2), 150, 2009
6 Subthreshold behavior of triple-gate MOSFETs on SOI material
Lemme MC, Mollenhauer T, Henschel W, Wahlbrink T, Baus M, Winkler O, Granzner R, Schwierz F, Spangenberg B, Kurz H
Solid-State Electronics, 48(4), 529, 2004