화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 New insights into the role of nitrogen-bonding configurations in enhancing the photocatalytic activity of nitrogen-doped graphene aerogels
Jiang YQ, Chowdhury S, Balasubramanian R
Journal of Colloid and Interface Science, 534, 574, 2019
2 Atomic configurations in AP-MOVPE grown lattice-mismatched InGaAsN films unravelled by X-ray photoelectron spectroscopy combined with bulk and surface characterization techniques
Lopez-Escalante MC, Sciana B, Dawidowski W, Bielak K, Gabas M
Applied Surface Science, 433, 1, 2018
3 Nitrogen and hydrogen content, morphology and phase composition of hot filament chemical vapor deposited diamond films from NH3/CH4/H-2 gas mixtures
Cherf S, Chandran M, Michaelson S, Elfimchev S, Akhvlediani R, Hoffman A
Thin Solid Films, 638, 264, 2017
4 The electrical properties of low pressure chemical vapor deposition Ga doped ZnO thin films depending on chemical bonding configuration
Jung H, Kim D, Kim H
Applied Surface Science, 297, 125, 2014
5 HR-EELS study of hydrogen bonding configuration, chemical and thermal stability of detonation nanodiamond films
Michaelson S, Akhvlediani R, Petit T, Girard HA, Arnault JC, Hoffman A
Applied Surface Science, 305, 160, 2014
6 Crystallization mechanism of silicon quantum dots upon thermal annealing of hydrogenated amorphous Si-rich silicon carbide films
Wen GZ, Zeng XB, Liao WG, Cao CC
Thin Solid Films, 552, 18, 2014
7 The structure, surface topography and mechanical properties of Si-C-N films fabricated by RF and DC magnetron sputtering
Shi ZF, Wang YJ, Du C, Huang N, Wang L, Ning CY
Applied Surface Science, 258(4), 1328, 2011
8 Electrical properties of a-Si:H thin films as a function of bonding configuration
Kim DY, Kim IS, Choi SY
Solar Energy Materials and Solar Cells, 93(2), 239, 2009
9 Thermal stability and bonding configuration of fluorine-modified low-k SiOC : H composite films
JangJian SK, Liu CP, Wang YL, Hwang WS, Tseng WT
Thin Solid Films, 469-470, 460, 2004
10 Structural and electrical properties of co-sputtered fluorinated amorphous carbon film
Jung HS, Park HH
Thin Solid Films, 420-421, 248, 2002