검색결과 : 3건
No. | Article |
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1 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |
2 |
Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope Cho SH, Yang F, Sun GR, Eller MJ, Clark C, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Macromolecular Rapid Communications, 35(4), 437, 2014 |
3 |
Various Brush Polymers Through Ring Opening Metathesis Polymerization and Nitroxide Radical Coupling Reaction Cerit N, Cakir N, Dag A, Sirkecioglu O, Durmaz H, Hizal G, Tunca U Journal of Polymer Science Part A: Polymer Chemistry, 49(13), 2850, 2011 |