검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Nanoscale CMOSFET performance improvement and reliability study for local strain techniques Huang HL, Chen JK, Houng MP Solid-State Electronics, 79, 31, 2013 |
| 2 |
Phenomena of n-type metal-oxide-semiconductor-field-effect-transistors with contact etch stop layer stressor for different channel lengths Hsu HW, Lin KC, Lee CC, Twu MJ, Huang HS, Chen SY, Peng MR, Teng HH, Liu CH Thin Solid Films, 544, 120, 2013 |
| 3 |
High gate voltage drain current leveling off and its low-frequency noise in 65 nm fully-depleted strained and non-strained SOI nMOSFETs LukyanchikovA N, Garbar N, Kudina V, Smolanka A, Lokshin M, Simoen E, Claeys C Solid-State Electronics, 52(5), 801, 2008 |
| 4 |
Impact strain engineering on gate stack quality and reliability Claeys C, Simoen E, Put S, Giusi G, Crupi F Solid-State Electronics, 52(8), 1115, 2008 |