검색결과 : 70건
No. | Article |
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1 |
Y Enhancing separation efficiency in European syngas industry by using zeolites Luna-Triguero A, Vicent-Luna JM, Jansman MJ, Zafeiropoulos G, Tsampas MN, van de Sanden MCM, Akse HN, Calero S Catalysis Today, 362, 113, 2021 |
2 |
Role of Electron-Ion Dissociative Recombination in CH4 Microwave Plasma on Basis of Simulations and Measurements of Electron Energy Minea T, van de Steeg AW, Wolf B, da Silva AS, Peeters FJJ, van den Bekerom DCM, Butterworth T, Ong Q, van de Sanden MCM, van Rooij GJ Plasma Chemistry and Plasma Processing, 39(5), 1275, 2019 |
3 |
Vibrational Kinetics in Plasma as a Functional Problem: A Flux-Matching Approach Diomede P, van de Sanden MCM, Longo S Journal of Physical Chemistry A, 122(39), 7918, 2018 |
4 |
Plasma conductivity as a probe for ambient air admixture in an atmospheric pressure plasma jet Peeters FJJ, Rumphorst RF, van de Sanden MCM Plasma Chemistry and Plasma Processing, 38(1), 63, 2018 |
5 |
The electrochemistry of iron oxide thin films nanostructured by high ion flux plasma exposure Sinha R, Tanyeli I, Lavrijsen R, van de Sanden MCM, Bieberle-Hutter A Electrochimica Acta, 258, 709, 2017 |
6 |
Nanostructuring of iron thin films by high flux low energy helium plasma Bieberle-Hutter A, Tanyeli I, Lavrijsen R, Koopmans B, Sinha R, van de Sanden MCM Thin Solid Films, 631, 50, 2017 |
7 |
On the intrinsic moisture permeation rate of remote microwave plasma-deposited silicon nitride layers van Assche FJH, Unnikrishnan S, Michels JJ, van Mol AMB, van de Weijer P, van de Sanden MCM, Creatore M Thin Solid Films, 558, 54, 2014 |
8 |
Substrate Biasing during Plasma-Assisted ALD for Crystalline Phase-Control of TiO2 Thin Films Profijt HB, van de Sanden MCM, Kessels WMM Electrochemical and Solid State Letters, 15(2), G1, 2012 |
9 |
Gas-Phase Hydrosilylation of Plasma-Synthesized Silicon Nanocrystals with Short- and Long-Chain Alkynes Weeks SL, Macco B, van de Sanden MCM, Agarwal S Langmuir, 28(50), 17295, 2012 |
10 |
Kinetic study of solid phase crystallisation of expanding deposited a-Si:H Law F, Hoex B, Wang J, Luther J, Sharma K, Creatore M, van de Sanden MCM Thin Solid Films, 520(17), 5820, 2012 |