화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition
Kwak I, Kavrik M, Park JH, Grissom L, Fruhberger B, Wong KT, Kang S, Kummel AC
Applied Surface Science, 463, 758, 2019
2 Influence of annealing in H atmosphere on the electrical properties of Al2O3 layers grown on p-type Si by the atomic layer deposition technique
Kolkovsky V, Stubner R, Langa S, Wende U, Kaiser B, Conrad H, Schenk H
Solid-State Electronics, 123, 89, 2016
3 Extraction of interface state density at SiO2/SiC interfaces based on impedance measurements with different temperatures
Yoshida N, Waki E, Arai M, Yamasaki K, Han JH, Takenaka M, Takagi S
Thin Solid Films, 557, 237, 2014
4 Hall effect in the channel of 3C-SiC MOSFETs
Krieger M, Pensl G, Bakowski M, Schoner A, Nagasawa H, Abe M
Materials Science Forum, 483, 441, 2005
5 Low density of interface states in n-type 4H-SiC MOS capacitors achieved by nitrogen implantation
Ciobanu F, Pensl G, Afanas'ev VV, Schoner A
Materials Science Forum, 483, 693, 2005
6 Evaluation of MOS structures processed on 4H-SiC layers grown by PVT epitaxy
Ciechonski RR, Syvajarvi M, Wahab Q, Yakimova R
Solid-State Electronics, 49(12), 1917, 2005
7 Barrier formation at metal-organic interfaces: dipole formation and the charge neutrality level
Vazquez H, Flores F, Oszwaldowski R, Ortega J, Perez R, Kahn A
Applied Surface Science, 234(1-4), 107, 2004
8 Cathodoluminescence study of Si/SiO2 interface structure
Zamoryarskaya MV, Sokolov VI, Plotnikov V
Applied Surface Science, 234(1-4), 214, 2004
9 The role of interface states and series resistance on the I-V and C-V characteristics in Al/SnO2/p-Si Schottky diodes
Altindal S, Karadeniz S, Tugluoglu N, Tataroglu A
Solid-State Electronics, 47(10), 1847, 2003
10 Traps at the interface of 3C-SiC/SiO2-MOS-structures
Ciobanu F, Pensl G, Nagasawa H, Schoner A, Dimitrijev S, Cheong KY, Afanas'ev VV, Wagner G
Materials Science Forum, 433-4, 551, 2002