| 1 |
Impact of pressure on carbon films by PECVD toward high deposition rates and high stability as metallic bipolar plate for PEMFCs
Che J, Yi PY, Peng LF, Lai XM
International Journal of Hydrogen Energy, 45(32), 16277, 2020 |
| 2 |
Investigation on the influence of high deposition pressure on the mcirostructure and hydrogen impurity incorporated in nanocrystalline diamond films
Weng J, Liu F, Xiong LW, Bai A, Wang JH
Journal of Crystal Growth, 495, 1, 2018 |
| 3 |
Influence of Working Pressure on the Al2O3 Film Properties in Plasma-Enhanced Atomic Layer Deposition
Hur M, Kim DJ, Kang WS, Lee JO, Song YH, Kim SJ, Kim ID
Plasma Chemistry and Plasma Processing, 36(2), 679, 2016 |
| 4 |
Powder deposition in three parallel-oriented dies of cylindrical and E shapes
Xie X, Puri VM
Advanced Powder Technology, 23(1), 1, 2012 |
| 5 |
Pressure dependence of morphology and phase composition of SiC films deposited by microwave plasma chemical vapor deposition on cemented carbide substrates
Yu SW, Fan PW, Tang WZ, Li XJ, Hu HL, Hei HJ, Zhang SK, Lu FX
Thin Solid Films, 520(2), 828, 2011 |
| 6 |
Enhancement of electrical performance in In2O3 thin-film transistors by improving the densification and surface morphology of channel layers
Zhang HZ, Cao HT, Chen AH, Liang LY, Liu ZM, Wan Q
Solid-State Electronics, 54(4), 479, 2010 |
| 7 |
Deposition pressure and rate effects on the microstructure and magnetic properties of sputtered tape media
Han JX, Hintz M, Sexton J, Skorjanec J, Lundstrom G
Thin Solid Films, 518(8), 2179, 2010 |
| 8 |
The effect of sputtering pressure on electrical, optical and structure properties of indium tin oxide on glass
Elhalawaty S, Siyaramakrishnan K, Theodore ND, Alford TL
Thin Solid Films, 518(12), 3326, 2010 |
| 9 |
Influence of Ru/Ru-SiO(2) underlayers on the microstructure and magnetic properties of CoPt-SiO(2) perpendicular recording media
Tang RJ, Ho P, Lim BC
Thin Solid Films, 518(20), 5813, 2010 |
| 10 |
The spatial thickness distribution of metal films produced by large area pulsed laser deposition
Pryds N, Schou J, Linderoth S
Applied Surface Science, 253(19), 8231, 2007 |
