| 1 |
Parameter study of filtration characteristics of granular filters for hot gas clean-up
Wang FL, Tang SZ, He YL, Kulacki FA, Tao YB
Powder Technology, 353, 267, 2019 |
| 2 |
Uniformity Differentiation Analysis. Part 2: Powder Deposition Characteristics in Circular Shallow Die Using Feed Shoe with Circular Cross Section
Roudsari SS, Puri VM
Particulate Science and Technology, 28(2), 173, 2010 |
| 3 |
Evaluation of different deposition conditions on thin films deposited by electrostatic spray deposition using a uniformity test
Roncallo S, Painter JD, Ritchie SA, Cousins MA, Finnis MV, Rogers KD
Thin Solid Films, 518(17), 4821, 2010 |
| 4 |
Theoretical studies of displacement deposition of nickel into porous silicon with ultrahigh aspect ratio
Xu CK, Li MH, Zhang X, Tu KN, Xie YH
Electrochimica Acta, 52(12), 3901, 2007 |
| 5 |
Implementation of a geometrically based criterion for film uniformity control in a planetary SiCCVD reactor system
Parikh RP, Adomaitis RA, Oliver JD, Ponczak BH
Journal of Process Control, 17(5), 477, 2007 |
| 6 |
sp3's experience using hot filament CVD reactors to grow diamond for an expanding set of applications
Herlinger J
Thin Solid Films, 501(1-2), 65, 2006 |
| 7 |
Aspect Ratio-Dependent Etching on Metal Etch - Modeling and Experiment
Xie RJ, Kava JD, Siegel M
Journal of Vacuum Science & Technology A, 14(3), 1067, 1996 |
| 8 |
DEPOSITION UNIFORMITIES ON A WAFER AND IN A TRENCH FOR TUNGSTEN SILICIDE LPCVD IN A SINGLE-WAFER REACTOR
Park JH
Korean Journal of Chemical Engineering, 13(2), 105, 1996 |
