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High-rate Deposition of Polycrystalline Diamond Film Using Time-series Exposure of Modulated/Non-modulated Induction Thermal Plasmas at Different Flow Rates of Carbon Source Gas Hata K, Tanaka Y, Kano N, Nakano Y, Uesugi Y, Ishijima T Plasma Chemistry and Plasma Processing, 41(3), 757, 2021 |
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sp3's experience using hot filament CVD reactors to grow diamond for an expanding set of applications Herlinger J Thin Solid Films, 501(1-2), 65, 2006 |
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Method of porous diamond deposition on porous silicon Baranauskas V, Peterlevitz AC, Chang DC, Durrant SF Applied Surface Science, 185(1-2), 108, 2001 |
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Influence of the gas phase on doping in diamond chemical vapor deposition Dandy DS Thin Solid Films, 381(1), 1, 2001 |
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Tunable diode laser diagnostic studies of H-2-Ar-O-2 microwave plasmas containing methane or methanol Ropcke J, Mechold L, Kaning M, Fan WY, Davies PB Plasma Chemistry and Plasma Processing, 19(3), 395, 1999 |
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C-2 column densities in H-2/Ar/CH4 microwave plasmas Goyette AN, Matsuda Y, Anderson LW, Lawler JE Journal of Vacuum Science & Technology A, 16(1), 337, 1998 |
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Carbon based thin film cathodes for field emission displays Weber A, Hoffmann U, Klages CP Journal of Vacuum Science & Technology A, 16(3), 919, 1998 |
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Distribution of species within an ethylene electron cyclotron resonance-microwave plasma Webb SF, Gaddy GA, Blumenthal R Journal of Vacuum Science & Technology A, 16(4), 2148, 1998 |
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Diamond deposition procedure from microwave plasmas using a mixture of CO2-CH4 as carbon source Itoh K, Matsumoto O Thin Solid Films, 316(1-2), 18, 1998 |
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Positive bias effects on the growth of diamond at pressures below 100 mTorr Teii K, Yoshida T Thin Solid Films, 316(1-2), 24, 1998 |