| 1 |
Effect of deposition temperature on the bonding configurations and properties of fluorine doped silicon oxide film
Lu WL, Kuo TW, Huang CH, Wang NF, Tsai YZ, Wang MW, Hung CI, Houng MP
Thin Solid Films, 520(1), 35, 2011 |
| 2 |
Deposition damage evaluation of fluorine doped silicon oxide using simple damage monitoring system
Kim DH, Kim B, Lee J, Song JT
Thin Solid Films, 518(22), 6482, 2010 |
| 3 |
Microcrystalline-phase p-type a-Si : O : H windows prepared by Cat-CVD
Matsumoto Y, Yu ZR, Sanchez RV
Solar Energy Materials and Solar Cells, 92(5), 576, 2008 |
| 4 |
The characteristics of carbon-doped silicon oxide films with nano-pore structure deposited using UV-assisted PECVD
Yang CS, Choi CK
Thin Solid Films, 506, 8, 2006 |
| 5 |
Study on precipitations of fluorine-doped silicon oxide
Wu J, Wang YL, Liu CP, Chang SC, Kuo CT, Ay C
Thin Solid Films, 447, 599, 2004 |
| 6 |
Low dielectric constant films prepared by plasma-enhanced chemical vapor deposition from trimethylsilane
Wang MR, Rusli, Yu MB, Babu N, Li CY, Rakesh K
Thin Solid Films, 462-63, 219, 2004 |
| 7 |
The influence of carbon content in carbon-doped silicon oxide film by thermal treatment
Yang CS, Yu YH, Lee KM, Lee HJ, Choi CK
Thin Solid Films, 435(1-2), 165, 2003 |
| 8 |
Reactive pulsed laser deposition of silica and doped silica thin films
Ford AC, Tepper T, Ross CA
Thin Solid Films, 437(1-2), 211, 2003 |
| 9 |
Structure characterization of carbon and fluorine-doped silicon oxide films with low dielectric constant
Ding SJ, Chen L, Wan XG, Wang PF, Zhang JY, Zhang DW, Wang JT
Materials Chemistry and Physics, 71(2), 125, 2001 |
