| 1 |
Reactive bipolar pulsed dual magnetron sputtering of ZrN films: The effect of duty cycle
Rizzo A, Valerini D, Capodieci L, Mirenghi L, Di Benedetto F, Protopapa ML
Applied Surface Science, 427, 994, 2018 |
| 2 |
Characteristics of ITO Thin Films for the Plasma Display Panel Prepared by a MF Dual Magnetron Sputtering in the Oxygen Atmosphere
Lee JH, Sohn SH, Moon JH, Park MS, Lee SG
Molecular Crystals and Liquid Crystals, 499, 500, 2009 |
| 3 |
Nanostructure of photocatalytic TiO2 films sputtered at temperatures below 200 degrees C
Sicha J, Musil J, Meissner M, Cerstvy R
Applied Surface Science, 254(13), 3793, 2008 |
| 4 |
Investigation of Ti/TiN multilayered films in a reactive mid-frequency dual-magnetron sputtering
Xiang Y, Hua M, Cheng-Biao W, Zhi-Qiang F, Yang L
Applied Surface Science, 253(7), 3705, 2007 |
| 5 |
Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering
Mohamed SH, Anders A
Thin Solid Films, 515(13), 5264, 2007 |
| 6 |
Fabrication and characterization of metal and semiconductor SmS thin films by rf/dc dual magnetron sputtering
Tanemura S, Koide S, Senzaki Y, Miao L, Hirai H, Mori Y, Jin P, Kaneko K, Terai A, Nabatova-Gabain N
Applied Surface Science, 212, 279, 2003 |
