| 1 |
Surface characterization of poly(methylmethacrylate) based nanocomposite thin films containing Al2O3 and TiO2 nanoparticles
Lewis S, Haynes V, Wheeler-Jones R, Sly J, Perks RM, Piccirillo L
Thin Solid Films, 518(10), 2683, 2010 |
| 2 |
Fullerene-incorporation for enhancing the electron beam resist performance for contact hole patterning and filling
You HC, Ko FH, Lei TF
Thin Solid Films, 500(1-2), 214, 2006 |
| 3 |
Spatially extended polymerization of C-60 clusters induced by localized current injection from scanning tunneling microscope tips
Nakamura Y, Mera Y, Maeda K
Molecular Crystals and Liquid Crystals, 386, 135, 2002 |
| 4 |
Formation of SnO2 thin film by pyrolysis of a photo-cross-linked organotin polymer
Tamai T, Ichinose N
Macromolecules, 33(7), 2505, 2000 |
| 5 |
Quantification of the extent of reaction in a negative, novolac-based, chemically amplified resist
Dentinger PM, Taylor JW
Journal of Vacuum Science & Technology B, 15(6), 2632, 1997 |
| 6 |
Resist Application Effects on Chemically Amplified Resist Response
Dentinger PM, Nelson CM, Rhyner SJ, Taylor JW, Fedynyshyn TH, Cronin MF
Journal of Vacuum Science & Technology B, 14(6), 4239, 1996 |
| 7 |
Degradation of a Trimethylsilyl Monolayer on Silicon Substrates Induced by Scanning Probe Anodization
Sugimura H, Nakagiri N
Langmuir, 11(10), 3623, 1995 |
| 8 |
Analysis of Ppmma Films from Oxygen Plasma Using X-Ray Photoelectron-Spectroscopy
Kuruvilla BA, Zambre M, Gosavi S, Gorwadkar S, Datta A, Gangal SA, Kulkarni SK
Journal of Polymer Science Part A: Polymer Chemistry, 32(12), 2275, 1994 |
| 9 |
Nanometer-Scale Imaging Characteristics of Novolak Resin-Based Chemical Amplification Negative Resist Systems and Molecular-Weight Distribution Effects of the Resin Matrix
Shiraishi H, Yoshimura T, Sakamizu T, Ueno T, Okazaki S
Journal of Vacuum Science & Technology B, 12(6), 3895, 1994 |
| 10 |
플라즈마 공중합 MMA-Styrene 박막의 E-beam 레지스트 특성
박종관, 이덕출
Polymer(Korea), 18(5), 835, 1994 |
