검색결과 : 43건
| No. | Article |
|---|---|
| 1 |
유리기판 박막화를 위한 습식공정에서 식각액 성분의 영향 신영식, 이원규 Korean Chemical Engineering Research, 58(3), 474, 2020 |
| 2 |
Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether Kim JH, Park JS, Kim CK Thin Solid Films, 669, 262, 2019 |
| 3 |
Angular dependences of SiO2 etch rates at different bias voltages in CF4, C2F6, and C4F8 plasmas Kim JH, Cho SW, Park CJ, Chae H, Kim CK Thin Solid Films, 637, 43, 2017 |
| 4 |
Experimental investigation of photoresist etching by kHz AC atmospheric pressure plasma jet Wang LJ, Zheng YS, Wu C, Jia SL Applied Surface Science, 385, 191, 2016 |
| 5 |
산화구리 잔유물 제거를 위한 카르복시산 함유 반수계 용액의 세정특성 고천광, 이원규 Korean Chemical Engineering Research, 54(4), 548, 2016 |
| 6 |
Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma You D, Lee YS, Lee JB, Chang HY Current Applied Physics, 15(3), 183, 2015 |
| 7 |
Study of wet etching thin films of indium tin oxide in oxalic acid by monitoring the resistance Mammana SS, Greatti A, Luiz FH, da Costa FI, Mammana AP, Calligaris GA, Cardoso LP, Mammana CIZ, den Engelsen D Thin Solid Films, 567, 20, 2014 |
| 8 |
Bosch 공정에서 Si 식각속도와 식각프로파일에 대한 Ar 첨가의 영향 지정민, 조성운, 김창구 Korean Chemical Engineering Research, 51(6), 755, 2013 |
| 9 |
Comparison of chlorine- and fluorine-based inductively coupled plasmas for dry etching of InGaZnO4 films Park JC, Jeong OG, Kim JK, Yun YH, Pearton SJ, Cho H Thin Solid Films, 546, 136, 2013 |
| 10 |
Real-time virtual metrology and control for plasma etch Lynn SA, MacGearailt N, Ringwood JV Journal of Process Control, 22(4), 666, 2012 |