검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Development of plasma etching process for sub-50 nm TaN gate Bliznetsov V, Kumar R, Bera LK, Yip LW, Du AY, Hui TE Thin Solid Films, 504(1-2), 140, 2006 |
| 2 |
Surface quality of InP etched with tertiarybutylchloride in an MOVPE reactor Franke D, Sabelfeld N, Ebert W, Harde P, Wolfram P, Grote N Journal of Crystal Growth, 248, 421, 2003 |
| 3 |
Synthesis, growth and characterization of nonlinear optical material: L-arginine fluoride Hameed ASH, Anandan P, Jayavel R, Ramasamy P, Ravi G Journal of Crystal Growth, 249(1-2), 316, 2003 |
| 4 |
Backside etching of UV-transparent materials at the interface to liquids Bohme R, Braun A, Zimmer K Applied Surface Science, 186(1-4), 276, 2002 |
| 5 |
Understanding of etch mechanism and etch depth distribution in inductively coupled plasma etching of GaAs Lee JW, Jeon MH, Devre M, Mackenzie KD, Johnson D, Sasserath JN, Pearton SJ, Ren F, Shul RJ Solid-State Electronics, 45(9), 1683, 2001 |