화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization
Cheng YL, Wang YL, Liu CP, Wu YL, Lo KY, Liu CW, Lan JK, Ay C, Feng MS
Materials Chemistry and Physics, 83(1), 150, 2004
2 Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application
Cheng YL, Wang YL, Liu CW, Wu YL, Lo KY, Liu CP, Lan JK
Thin Solid Films, 398-399, 533, 2001