| 1 |
Growth and characterization of DAST crystal with large-thickness
Cao LF, Teng B, Zhong DG, Hao L, Sun Q
Journal of Crystal Growth, 451, 188, 2016 |
| 2 |
Validity of Hartman-Perdok PBC theory in prediction of crystal morphology from solution and surface X-ray diffraction of potassium dihydrogen phosphate (KDP)
Strom CS
Journal of Crystal Growth, 222(1-2), 298, 2001 |
| 3 |
Reflectance difference spectroscopy: a powerful tool for in situ investigations of II-VI compounds with Mn
Bonanni A, Hingerl K, Sitter H, Stifter D
Thin Solid Films, 367(1-2), 216, 2000 |
| 4 |
Kinetics of disordering of two-dimensional organic phases at the electrochemical interface
Poelman M, Buess-Herman C, Badiali JP
Langmuir, 15(6), 2194, 1999 |
| 5 |
Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100)
Mao AY, Son KA, Hess DA, Brown LA, White JM, Kwong DL, Roberts DA, Vrtis RN
Thin Solid Films, 349(1-2), 230, 1999 |
| 6 |
Studies on the anodic and cathodic polarization of lead in sodium sulphate solution
Abd El Aal EE
Journal of Power Sources, 75(1), 36, 1998 |
| 7 |
Structural, optical and electrical characteristics of yttrium oxide films deposited by laser ablation
Araiza JJ, Cardenas M, Falcony C, Mendez-Garcia VH, Lopez M, Contreras-Puente G
Journal of Vacuum Science & Technology A, 16(6), 3305, 1998 |
| 8 |
Surface roughness, strain, and alloy segregation in lattice-matched heteroepitaxy
Priester C, Grenet G
Journal of Vacuum Science & Technology B, 16(4), 2421, 1998 |
| 9 |
Electronic structure and chemical characterization of ultrathin insulating films
Sanz JM, Soriano L, Prieto P, Tyuliev G, Morant C, Elizalde E
Thin Solid Films, 332(1-2), 209, 1998 |
| 10 |
MOS capacitor characteristics of plasma oxide on partially strained SiGeC films
Ray SK, Bera LK, Maiti CK, John S, Banerjee SK
Thin Solid Films, 332(1-2), 375, 1998 |
