화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD
Chubarov M, Mercier F, Lay S, Charlot F, Crisci A, Coindeau S, Encinas T, Ferro G, Reboud R, Boichot R
Thin Solid Films, 623, 65, 2017
2 An integrated model for halide chemical vapor deposition of silicon carbide epitaxial films
Wang R, Ma RH
Journal of Crystal Growth, 310(18), 4248, 2008
3 Kinetics of halide chemical vapor deposition of silicon carbide film
Wang R, Ma RH
Journal of Crystal Growth, 308(1), 189, 2007