| 1 |
Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields
Sato G, Kato T, Oohara W, Hatakeyama R
Thin Solid Films, 506, 550, 2006 |
| 2 |
Growth and characterization of ZnO film on Si(111) substrate by helicon wave plasma-assisted evaporation
Lee DY, Choi CH, Kim SH
Journal of Crystal Growth, 268(1-2), 184, 2004 |
| 3 |
High growth-rate fabrication of micro-crystalline silicon by Helicon wave plasma CVD
Endo K, Isomura M, Taguchi M, Tarui H, Kiyama S
Solar Energy Materials and Solar Cells, 66(1-4), 283, 2001 |
| 4 |
Development of a compact nitrogen radical source by helicon-wave discharge employing a permanent magnet
Sasaki K, Kokubu H, Hayashi D, Kadota K
Thin Solid Films, 386(2), 243, 2001 |
| 5 |
SiO2 etching using high density plasma sources
Tsukada T, Nogami H, Nakagawa Y, Wani E, Mashimo K, Sato H, Samukawa S
Thin Solid Films, 341(1-2), 84, 1999 |
| 6 |
Investigation of surface polymerization on silicon exposed to C4F8 helicon wave plasmas
Lee WJ, Kim HS, Yeom GY, Baek JT
Thin Solid Films, 341(1-2), 184, 1999 |
| 7 |
Effects of antenna wavenumber spectrum and metal end plate on plasma characteristics excited by helicon wave
Shinohara S, Kaneda N, Kawai Y
Thin Solid Films, 316(1-2), 139, 1998 |
