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| No. | Article |
|---|---|
| 1 |
Influence of hydrogen dilution on the growth of nanocrystalline silicon carbide films by low-frequency inductively coupled plasma chemical vapor deposition Cheng Q, Xu S, Chai JW, Huang SY, Ren YP, Long JD, Rutkevych PP, Ostrikov K Thin Solid Films, 516(18), 5991, 2008 |