| 1 |
Low interface trap density in scaled bilayer gate oxides on 2D materials via nanofog low temperature atomic layer deposition
Kwak I, Kavrik M, Park JH, Grissom L, Fruhberger B, Wong KT, Kang S, Kummel AC
Applied Surface Science, 463, 758, 2019 |
| 2 |
Solution-processed organic field-effect transistors with cross-linked poly(4-vinylphenol)/polyvinyl alcohol bilayer dielectrics
Zhang HY, Zhang F, Sun J, Zhang M, Hu YF, Lou ZD, Hou YB, Teng F
Applied Surface Science, 478, 699, 2019 |
| 3 |
Characterization and optimization of MIS-HEMTs device of high similar to k dielectric material on quaternary barrier of Al0.42In0.03Ga0.55N/UID-AIN/GaN/GaN heterostructure for high power switching application
Tarauni YU, Thiruvadigal DJ, Joseph HB
Applied Surface Science, 488, 427, 2019 |
| 4 |
Nucleation engineering for atomic layer deposition of uniform sub-10 nm high-K dielectrics on MoTe2
Lin YS, Kwak I, Chung TF, Yang JR, Kummel AC, Chen MJ
Applied Surface Science, 492, 239, 2019 |
| 5 |
High-k polymer nanocomposites with 1D filler for dielectric and energy storage applications
Huang XY, Sun B, Zhu YK, Li ST, Jiang PK
PROGRESS IN MATERIALS SCIENCE, 100, 187, 2019 |
| 6 |
Achieving enhanced pH sensitivity using capacitive coupling in extended gate FET sensors with various high-K sensing films
Kang JW, Cho WJ
Solid-State Electronics, 152, 29, 2019 |
| 7 |
Interface state degradation during AC positive bias temperature instability stress
Kang SC, Kim SM, Jung U, Kim Y, Park W, Lee BH
Solid-State Electronics, 158, 46, 2019 |
| 8 |
Comparison of memory effect with voltage or current charging pulse bias in MIS structures based on codoped Si-NCs embedded in SiO2 or HfOx
Mazurak A, Mroczynski R
Solid-State Electronics, 159, 157, 2019 |
| 9 |
Improvement of the electrical and interfacial propertie of TiN/ZrO2 by a modulated atomic layer deposition process with controlled O-3 dosing
Song H, Kim D, Kim Y, Jung H, Lim H, Lee S, Yong K
Thin Solid Films, 675, 153, 2019 |
| 10 |
High resistance ratio of bipolar resistive switching in a multiferroic/high-K Bi(Fe0.95Cr0.(05))O-3/ZrO2/Pt heterostructure
Dong BW, Miao J, Han JZ, Shao F, Yuan J, Meng KK, Wu Y, Xu XG, Jiang Y
Applied Surface Science, 434, 687, 2018 |
