검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Characterization and thermal stability of fluorosilicate glass films deposited by high density plasma chemical vapor deposition with different bias power Hsiao WC, Liu CP, Wang YL, Cheng YL Thin Solid Films, 498(1-2), 289, 2006 |
| 2 |
Integration of a stack of two fluorine doped silicon oxide film with ULSI interconnect metallization Cheng YL, Wang YL, Liu CP, Wu YL, Lo KY, Liu CW, Lan JK, Ay C, Feng MS Materials Chemistry and Physics, 83(1), 150, 2004 |
| 3 |
Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application Cheng YL, Wang YL, Liu CW, Wu YL, Lo KY, Liu CP, Lan JK Thin Solid Films, 398-399, 533, 2001 |