| 1 |
Gas doping ratio effects on p-type hydrogenated nanocrystalline silicon thin films grown by hot-wire chemical vapor deposition
Luo PQ, Zhou ZB, Chan KY, Tang DY, Cui RQ, Dou XM
Applied Surface Science, 255(5), 2910, 2008 |
| 2 |
Combinatorial initiated chemical vapor deposition (iCVD) for polymer thin film discovery
Martin TP, Chan K, Gleason KK
Thin Solid Films, 516(5), 681, 2008 |
| 3 |
Hot-wire CVD deposited n-type mu c-Si films for mu c-Si/c-Si heterojunction solar cell applications
Lien SY, Wuu DS, Wu BR, Horng RH, Tseng MC, Yu HH
Thin Solid Films, 516(5), 765, 2008 |
| 4 |
High-throughput chemical vapor deposition system and thin-film silicon library
Wang Q, Liu FZ, Han DX
Macromolecular Rapid Communications, 25(1), 326, 2004 |
| 5 |
Hot-wire chemical vapor deposition of carbon nanotubes
Dillon AC, Mahan AH, Alleman JL, Heben MJ, Parilla PA, Jones KM
Thin Solid Films, 430(1-2), 292, 2003 |
| 6 |
Hot-wire CVD-grown microcrystalline silicon films with and without initial growing layer modification by transformer-coupled plasma
Kim DY, Ahn BJ, Moon SI, Yi J
Thin Solid Films, 395(1-2), 184, 2001 |
| 7 |
The influence of filament temperature on crystallographic properties of poly-Si films prepared by the hot-wire CVD method
Lee JC, Kang KH, Kim SK, Yoon KH, Song J, Park IJ
Thin Solid Films, 395(1-2), 188, 2001 |
