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Patterning the mechanical properties of hydrogen silsesquioxane films using electron beam irradiation for application in mechano cell guidance Lanniel M, Lu BR, Chen YF, Allen S, Buttery L, Williams P, Huq E, Alexander M Thin Solid Films, 519(6), 2003, 2011 |
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Thermal Properties of New Bismaleimide Resins Containing Hydrogen Silsesquioxane and Diallyl Bisphenol A Huang FW, Huang FR, Zhou Y, Du L Journal of Applied Polymer Science, 117(5), 2932, 2010 |
3 |
The comparative study of thermal stability among silicon dioxide, fluorinated silicate glass, hydrogen silsesquioxane, and organosilicate glass dielectrics on silicon Jeng JS, Chen JS Thin Solid Films, 516(18), 6013, 2008 |
4 |
Realization of various sub-micron metal patterns using room temperature nanoimprint lithography Sung JH, Lee MW, Lee SG, Park SG, Lee EH, O BH Thin Solid Films, 515(12), 5153, 2007 |
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Transformation of hydrogen silsesquioxane properties with RIE plasma treatment for advanced multiple-gate MOSFETs Penaud J, Fruleux F, Dubois E Applied Surface Science, 253(1), 395, 2006 |
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Positronium diffusion in porous oxide thin films Ito K, Kobayashi Y Materials Science Forum, 445-6, 307, 2004 |
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Positronium time-of-flight measurements of porous silsesquioxane films Yu RS, Kobayashi Y, Ohdaira T, Suzuki R, Ito K, Hirata K, Sato K Materials Science Forum, 445-6, 361, 2004 |
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Study the impact of liner thickness on the 0.18 mu m devices using low dielectric constant hydrogen silsesquioxane as the interlayer dielectric Lan JK, Wang YL, Wu YL, Liou HC, Wang JK, Chiu SY, Cheng YL, Feng MS Thin Solid Films, 377-378, 776, 2000 |