검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Infinitely high etch selectivity during CH4/H-2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask Kim DY, Ko JH, Park MS, Lee NE Thin Solid Films, 516(11), 3512, 2008 |
| No. | Article |
|---|---|
| 1 |
Infinitely high etch selectivity during CH4/H-2/Ar inductively coupled plasma (ICP) etching of indium tin oxide (ITO) with photoresist mask Kim DY, Ko JH, Park MS, Lee NE Thin Solid Films, 516(11), 3512, 2008 |