화학공학소재연구정보센터
검색결과 : 19건
No. Article
1 Schottky junction photodiode based on graphene-organic semiconductor heterostructure
Choi YJ, Woo HJ, Kim SC, Sun J, Kang MS, Song YJ, Cho JH
Journal of Industrial and Engineering Chemistry, 89, 233, 2020
2 Growth and characterisation of n- and p-type ZnTe thin films for applications in electronic devices
Olusola OI, Madugu ML, Abdul-Manaf NA, Dharmadasa IM
Current Applied Physics, 16(2), 120, 2016
3 Growth and characterization of heavily selenium doped GaAs using MOVPE
Maassdorf A, Hoffmann M, Weyers M
Journal of Crystal Growth, 315(1), 57, 2011
4 Self-heating and destruction of high-voltage 4H-SiC rectifier diodes under a single short current surge pulse
Levinshtein ME, Ivanov PA, Mnatsakanov TT, Palmour JW, Das MK, Hull BA
Solid-State Electronics, 52(11), 1802, 2008
5 Steady state self-heating and dc current-voltage characteristics of high-voltage 4H-SiC p(+)-n-n(+) rectifier diodes
Levinshtein ME, Mnatsakanov TT, Vanov PA, Palmour JW, Das MK, Hull BA
Solid-State Electronics, 51(6), 955, 2007
6 Silane overpressure post-implant annealing of Al dopants in SiC: Cold wall CVD apparatus
Rao S, Bergamini F, Nipoti R, Saddow SE
Applied Surface Science, 252(10), 3837, 2006
7 SiGe-Si junctions with boron-doped SiGe films deposited by co-sputtering
Jelenkovic EV, Tong KY, Cheung WY, Wong SP, Shi BR, Pang GKH
Solid-State Electronics, 50(2), 199, 2006
8 High power 4H-SiC pin diodes (10 kV class) with record high carrier lifetime
Ivanov PA, Levinshtein ME, Palmour JW, Das MK, Hull BA
Solid-State Electronics, 50(7-8), 1368, 2006
9 Ar annealing at 1600 degrees C and 1650 degrees C of Al+ implanted p(+)/n 4H-SiC diodes: Analysis of the J-V characteristics versus annealing temperature
Bergamini F, Moscatelli F, Canino M, Poggi A, Nipoti R
Materials Science Forum, 483, 625, 2005
10 J-v characteristics of Al+ ion implanted p(+)/n 4H-SiC diodes annealed in silane ambient at 1600 degrees C
Bergamini A, Rao SP, Saddow SE, Nipoti R
Materials Science Forum, 483, 629, 2005